Magnetic nanostructures formation via local anodic oxidation and magnetron sputtering through lithographic mask
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| Title | Magnetic nanostructures formation via local anodic oxidation and magnetron sputtering through lithographic mask |
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| Abstract | Changes of magnetic properties of thin metallic films caused by the magnetron sputtering technique and by oxidation lithography were studied. The magnetic nanostructure formation was done via a lithography by sputtering the material through a mask. The anodic oxidation lithography (LAO) via scanning probe microscopy (SPM) device Ntegra Aura was used to attempt to create the magnetic nanostructures. At the beginning, the work has been scoped to the preparation and testing multilayered magnetic nanostructures based on different combinations in material composition of layers. The magnetic properties of these samples were examined by Kerr phenomenon. We observed increasing of the magnetic hardness of the magnetic nanostructure when the copper layer in the composition of ferromagnetic and antiferromagnetic multilayers has been replaced by an aluminium layer. Adding the aluminium layer onto the copper layer resulted in a decrease of magnetic hardness. This work was followed by creating of horizontal nanostructures by LAO. Changes induced by the LAO observed in the magnetic properties of the samples correspond mainly to topographical changes of the surface. Changes in the magnetic properties induced by LAO or by a variability of sputtered layers could lead to the further production of magnetic printed circuit or photonic nanostructures. |
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| Date | 2016-10-22 |
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| Rights | http://creativecommons.org/licenses/by-nc-nd/3.0/ |