Characterization of Palladium-based Thin Films Prepared by Plasma-enhanced Metalorganic Chemical Vapor Deposition
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| Title | Characterization of Palladium-based Thin Films Prepared by Plasma-enhanced Metalorganic Chemical Vapor Deposition |
| Authors | |
| Abstract | The plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD) was used to prepare palladium–based thin films starting with palladium (II) acetylacetonate precursor (Pd(acac)2) mixed with argon (carrier gas). To characterize chemical structure and morphology of deposited films Raman spectroscopy and electron diffraction techniques were used. The energy dispersive X-ray microanalysis (EDX) was applied to specify composition of films. The film thickness was estimated by ellipsometric measurements. The obtained results show that the films have various composition depending on deposition parameters. It has been found that the thermal decomposition at 623 K of the films leads to the formation of fine 5 nm – 10 nm size palladium nanoparticles, to which the catalytic activity is attributed.DOI: http://dx.doi.org/10.5755/j01.ms.18.2.1913 |
| Publisher | Kaunas University of Technology |
| Date | 2012-06-20 |
| Source | Medžiagotyra Vol 18, No 2 (2012) |
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